Thin Film Studies on Silica in Mixed Cationic-Anionic Surfactant Solution

International Mineral Processing Congress
Lidia B. Alexandrova Hanumantha Rao Kota Eric Forssberg Robert J. Pugh Ljudmil S. Grigorov
Organization:
International Mineral Processing Congress
Pages:
9
File Size:
1504 KB
Publication Date:
Jan 1, 2003

Abstract

"We have used the microscopic thin balance developed by Scheludko at al. (1970) technique to study the stability and interactions within the thin film between the silica surface and air bubble with (i) a long chain C10 amine and (ii) a cationic/anionic surfactant systems consisting of mixtures of a long straight C10 chain amine with long straight chain C8, C10 and C12 sulfonates. It was found that the mixed surfactants caused lower contact angles, lower rates of the thin aqueous film rupture and longer film lifetime, compared to the pure amine system.This behavior was explained by the initial strong adsorption of positively charged interfacial complexes from the mixed surfactant system at the air/solution interface followed by adsorption at the silica interface. It was also shown that the chain length compatibility between the anionic and cationic surfactants controls the strength of the interfacial complex, determining an inhibition in the thin film rupture and dewetting of the film. The rupture mechanism was explained by an earlier established heterocoagulation mechanism between the positively charged air/solution interface and the solution/silica interface which remained negatively charged. The formation of the interfacial complex at the air/solution interface was confirmed by using surface tension data."
Citation

APA: Lidia B. Alexandrova Hanumantha Rao Kota Eric Forssberg Robert J. Pugh Ljudmil S. Grigorov  (2003)  Thin Film Studies on Silica in Mixed Cationic-Anionic Surfactant Solution

MLA: Lidia B. Alexandrova Hanumantha Rao Kota Eric Forssberg Robert J. Pugh Ljudmil S. Grigorov Thin Film Studies on Silica in Mixed Cationic-Anionic Surfactant Solution. International Mineral Processing Congress, 2003.

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