The Influence Of Chloride And Glue On Copper Electrocrystalilization On Titanium For Thin Film Applications

Electrocrystallization studies were conducted in a concentrated acid-copper electrolyte to determine the influence of chloride ions and glue on copper nucleation and on the structure of thin copper layers. Electrochemical experiments allied to SEM and XRD examination were performed to characterize the mechanism of nucleation in the presence of additives at 65°C. Results indicated that most of the copper nucleation from a 83 g dm-3 Cu2+ solution, with 140 g dm-3 of H2SO4 is achieved in a matter of milliseconds, Although the presence of chloride and glue, at the concentration levels tested, does not seem to substantially modify the nucleation mechanism, the morphology, nuclei density and the copper film structure and orientation are changed by the presence of additives and by electrolyte stirring.