Technology of High-Purity Silicon Dioxide Production

"The possibility of SiO2 5N production by staged purification of ammonium hexafluosilicate (NH4)2SiF6 is discussed. High-purity silicon dioxide can be obtained with fluoridation of quartz concentrate by solid NH4F at 100 °C, with further sublimation of the product at 320 °C, its dissolution, ammonia hydrolysis, filtration and drying of SiO2•nH2O. This is accompanied by regeneration of the processing reagent - NH4F.INTRODUCTIONProduction of high-purity silica-5N (SiO2 content over 99.999%) is an important and urgent task of the modern chemical industry. This material is used in the manufacture of optical glass, optical fibers for internet cables, silicon for solar power and electronics.Quartz concentrate is raw material for the production of silicon dioxide. The existing technologies of synthetic silicon dioxide were introduced in the mid-twentieth century. These methods are energy-consuming, multi-step and do not meet stringent environmental requirements. In fact, as some conventional technologies became obsolete; it became necessary to develop new methods for the production of synthetic silica. We believe that the fluoride technology of processing of quartz materials by ammonium fluoride is the most promising direction.In industry, silicon dioxide marked ""Silica White"" is obtained by liquid-phase method. The method consists of the precipitation of amorphous silica from sodium silicate solutions with acids. The resulting product is filtered, washed and dried. Depending on the deposition conditions and nature of the coagulant the ""Silica White"" is acidic, neutral or alkaline. The dry product is subjected to grinding. The degree of dispersion and porosity of the particles of Silica White depends on the nature of decomposition agent (a substance that decomposes the silicate) and coagulant, conditions of sedimentation, filtration and drying. During the drying process the silica particles are sintered into aggregates of a few millimeters."