Technical Papers and Discussions - Miscellaneous Metals and Alloys - An Electron Diffraction Study of Oxide Films Formed on Iron, Cobalt, Nickel, Chromium and Copper at High Temperatures (Metals Tech., Oct. 1946, T. P. 2068, with discussion)

The American Institute of Mining, Metallurgical, and Petroleum Engineers
E. A. Gulbransen J. W. Hickman
Organization:
The American Institute of Mining, Metallurgical, and Petroleum Engineers
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38
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1844 KB
Publication Date:
Jan 1, 1947

Abstract

One of the important factors that determine the resistance of a metal or alloy to further chemical reaction is the structure of the superficial oxide film. A thorough understanding of the physical and chemical structure as well as the stability of the oxide film formed on the surface as a function of time and temperature of the chemical reaction might furnish clues as to the nature of the reaction process and the protective nature of the film. A comprehensive program has been undertaken to study these phenomena. This paper summarizes the structure of the oxide films formed on the metals iron, cobalt, nickel, chromium and copper at temperatures up to 700°C. Before the introduction of the electron diffraction technique, it was necessary to use either direct chemical analyses or X-rav diffraction analyses to determine the nature of the oxide film formed on the metal or alloy. Chemical analyses yields information on the percentages of the several atomic species present in the film while X-ray diffraction analyses yield information on the atomic geometry. In special cases the information obtained may be identical, but in general both viewpoints are necessary. Much of the early work was carried out on the oxidation of bulk samples where thick films were obtained. The products were identified after cooling to room temperature by X-ray diffraction and chemical analyses. Although much useful information has been obtained in this manner. little could be learned about the character of the protective oxides during the period when the films were actually protective. Evidence concerning the chemical structure of thin oxide films has been made possible by the development of the electron diffraction reflection technique. In this method the most fruitful investigations have been made by carrying out the reaction in situ at the temperature at which the film is actually protective. Literature The oxidation of iron has been extensively investigated by X-ray and electron diffraction. Jackson and Quarrelll found that oxide films formed and examined at the same temperature differed considerably from those allowed to cool to room temperature. The results showed that below 400°C the oxide that was stable in intimate contact with iron was Fe³O4; between 515° and 900°C. the stable film was FeO. Above the upper change point of iron the oxide was found to be Fe³O4. From 400' to 515°C., FeO, Fe³O4 or a mixture of the two oxides was found. Recrystallization of the air-formed film below 400' and above 900°C. led to the formation of Fe3O4. In the range where thicker films consisted of FeO, the air-formed film was converted to a new hexagonal oxide not previously described.
Citation

APA: E. A. Gulbransen J. W. Hickman  (1947)  Technical Papers and Discussions - Miscellaneous Metals and Alloys - An Electron Diffraction Study of Oxide Films Formed on Iron, Cobalt, Nickel, Chromium and Copper at High Temperatures (Metals Tech., Oct. 1946, T. P. 2068, with discussion)

MLA: E. A. Gulbransen J. W. Hickman Technical Papers and Discussions - Miscellaneous Metals and Alloys - An Electron Diffraction Study of Oxide Films Formed on Iron, Cobalt, Nickel, Chromium and Copper at High Temperatures (Metals Tech., Oct. 1946, T. P. 2068, with discussion). The American Institute of Mining, Metallurgical, and Petroleum Engineers, 1947.

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