Simultaneous Behavior of Additives in Copper Electrorefining

Due to chemical and electrochemical behavior of the most common additives in copper electrorefining i.e. gelatine, thiourea and chloride ions, it is essential to simulate as far as possible true industrial practice while performing laboratory experiments. The three additives must be studied simultaneously, and added continuously to the electrorefining cell. Ratio electrolyte volume to cathode area; ratio bleed flow to cathode area; hydrodynamic conditions; residence time of electrolyte in the cell; current density; electrolyte and soluble anode must be as near as possible to industrial ones. Experiments performed in the author's laboratory show that under these conditions, reproducible results can be obtained at normal industrial current density and at high current density as well. Problems are however still encountered when developing a sensor for additives monitoring, due to electrolyte redox potential and to substrate influenced thin layer deposition.