Research On Separation And Regeneration Of Waste Acids From IT Manufacturing Process

The Minerals, Metals and Materials Society
Jae-Woo Ahn
Organization:
The Minerals, Metals and Materials Society
Pages:
11
File Size:
138 KB
Publication Date:
Jan 1, 2006

Abstract

Waste acids containing phosphoric, acetic, nitric and hydrofluoric acid were produced during the etching process of liquid crystal display and semiconductor manufacture. In recent years, the attention on the treatment of industrial waste acids has been increased considerably according to the reinforcement of the environmental regulations as well as the implementation of the economic considerations about the waste acids. Fundamental studies on the separation and regeneration of the mixed waste acids were conducted using Cyanex 923, Tri-octyle phosphate and 2-Ethylhexyl alcohol as an extractant by solvent extraction. It is considered that the extraction of liquid crystal display waste acids with Cyanex 923 and Tri-octyle phosphate, semiconductor waste acids with 2-Ethylhexylalcohol is applicable for the separation and recovery of acid. Finally, the acceptable recycling process from the multi-component waste etching acids was proposed.
Citation

APA: Jae-Woo Ahn  (2006)  Research On Separation And Regeneration Of Waste Acids From IT Manufacturing Process

MLA: Jae-Woo Ahn Research On Separation And Regeneration Of Waste Acids From IT Manufacturing Process. The Minerals, Metals and Materials Society, 2006.

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