Papers - An Electron Diffraction Study of Anodic Films (T. P. 1158)

The: structure of anodic films formed on aluminum and other metals under varied conditions is not well known despite the wide use of such films both as protective coatings and as the dielectric medium in electrolytic condensers. The present work was undertaken as a survey of the possibilities of electron diffraction in the investigation of anodic films, especially in comparing the properties of anodic films formed under different sets of conditions and subjected to various subsequent treatments. In addition, an effort has been made to compare surface films formed on aluminum by anodic treatment with surface films formed by heating, immersion in chemicals, etc. The elcctron diffraction method in many cases has been successfully applied to the study of thin surface films. Its principal advantage is that it can be used without removing the films from the base material upon which they have been formed. The low penetrating power of electrons, in the "reflection" diffraction method which has been used in this work, prevents the appearance of diffraction patterns from substances at depths greater than about 100 Angstrom units (lop6 cm.). Different investigations of the structure of anodic films have showll widely varying results, depending on the methods used in preparing the films. Apparently under some conditions these films are crystalline and under other conditions they are amorphous, and it has been difficult to say which type of structure will be found in any particular case. Schmid and Wassermann's1 X-ray diffraction patterns of eloxal‡ films show two broad, diffuse bands, which these investigators attribute to finely divided cubic y-Al2O3.§ Burgers, Claassen, and Zernicke³ obtained sharp X-ray