Institute of Metals Division - Diffusion Kinetics Affecting Formation of Silicide Coatings on Molybdenum and Tungsten (TN)

SILICIDE coatings on refractory metals are often applied by transporting a silicon halide vapor to a hot metal surface where dissociation or hydrogen reduction occurs. The subsequent chemical reaction to produce the coating requires diffusion of silicon or the refractory metal through the in situ silicide layer. This solid-state diffusion process step is often slower than the vapor-transport step and, therefore, rate controlling. This situation is analogous to the parabolic oxidation of metals in which the oxidation rate is controlled by diffusion through the oxide layer. The purposes of this study were to 1) measure the rate of formation of MoSiz and MoSi2 coatings under conditions such that the silicide diffusion process is rate controlling and lower silicide compounds are not formed and 2) determine by a marker experiment whether silicon or the respective refractory metals are the principal diffusing species in the disilicides.