Electrodeposition of Thin Multilayer Magnetic Materials

The Minerals, Metals and Materials Society
K. C. Liddell
Organization:
The Minerals, Metals and Materials Society
Pages:
11
File Size:
573 KB
Publication Date:
Jan 1, 1997

Abstract

"Cu/Ni multilayers exhibiting giant magnetoresistance were deposited from a single electrolyte under stepped potentiostatic control. To enable transport measurements to be made without remounting the multilayer film, we developed a novel method that involved plating on a thin metallic basal layer atop a rigid non-conducting Si substrate. Rotating ring-disk electrode techniques were used to monitor the composition and thickness of individual plated layers. Transmission electron microscopy confirmed that the interfaces between adjacent layers were sharp and that the structure of the layers was uniform throughout the film. Atomic force microscopy images indicated that the film's surface was smooth and free of defects.ELECTRODEPOSITION OF THIN MULTILAYER MAGNETIC MATERIALSI. IntroductionElectrodeposition of compositionally modulated films will in all likelihood continue to be used to produce the read heads for stored magnetic data. However, the next generation of head materials will require both improved sensitivity and reduced film thickness. Certain multi layers consisting of thin alternating ferromagnetic and nonmagnetic layers exhibit giant magneto resistance and consequently are promising candidates for read head applications. We have successfully made multilayer films with giant magnetoresistance that have total thicknesses as low as 25 nm, approximately 120 times thinner than the thinnest similar films reported in the literature. This paper describes early results from our work on electrodeposition and characterization of Cu/Ni multilayers, a model system with enhanced magnetic and mechanical properties, including the GMR effect. The structure and composition of the multilayers were determined using TEM, AFM, and electrochemical methods, and their magnetoresistance was measured by the standard four-probe technique. A novel method developed in this work enabled the transport properties of the ultrathin films to be measured reliably without the need to dissolve the cathode or handle the films. To provide a context for these results, short accounts of other work on giant magnetoresistance and multilayer electrodeposition are also included."
Citation

APA: K. C. Liddell  (1997)  Electrodeposition of Thin Multilayer Magnetic Materials

MLA: K. C. Liddell Electrodeposition of Thin Multilayer Magnetic Materials. The Minerals, Metals and Materials Society, 1997.

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