Disposal of Waste Fluoride and Chloride Gases in the Manufacturing Process of Semiconductors

"The chemical reactions of fluoride and chloride gases with metal chloride or metal oxide are utilized as an effective treatment for harmless disposal. These chemical reactions can be adopted in the temperature range of 80°C~400°C, which is lower than that in the combustion treatment (800°C). Reaction products are metal fluoride or metal chloride which are a harmless and a valuable chemical material as one of new resources. This paper, concerns with a new harmless disposal treatment of toxic global warming gases.IntroductionNew technology to make fluoride and chloride gases such as NF3, CF4, SF6 BF3, Cl2 and BCl3 harmless has been developed and a new concept on the removing toxic gas to be used in the advanced process of materials has been established. The fluoride gases ~re toxic and special type of gases to be used in the process of manufacturing semiconductors and their specific applications include the dry etching of semiconductors, cleaning of CVD systems, an oxidation agent for rocket fuel etc. Especially, NF3 is also attracting an attention as a high-energy source for chemical laser systems. As a fluoride gas like NF3 is, however; toxic and highly stable chemically, if discharged into the atmosphere, it is liable to cause far-reaching adverse influences on global warming in the same manner as carbon dioxide gas and feron gas.Up till now, the combustion treatment method has been adopted for the disposal of the gas, and when treating the gas by high-temperature combustion (800""C), the generation of nitrogen oxides (NOx), sulfur oxides (SOx) and hydrogen fluoride (HF) have been confirmed: These chemical substances are not only linked with an intense c0rrosion of the combustion systems but also create the generation of atmospheric pollution and acid rains, and therefore, constitute a serious social issue."