Combustion Chemical Vapor Deposition of Ceramic Coatings

The Minerals, Metals and Materials Society
W. B. Carter G. W. Book A. T. Hunt
Organization:
The Minerals, Metals and Materials Society
Pages:
11
File Size:
362 KB
Publication Date:
Jan 1, 1994

Abstract

"Combustion Chemical Vapor Deposition (CCVDSM ), an open air, flame assisted CVD process, is under development. The CCVD process produces non-line-of-sight, epitaxial deposition. Materials deposited include YBa2Cu3Ox' Y2BaCuOx, BaTiO3, Y2FesOI2, ZrO2, yttria stabilized ZrO2 (YSZ), partially (yttria) stabilized ZrO2 (PSZ), and amorphous silica. Two modifications of the CCVD process are being studied. Liquid fuel CCVD deposition, involves the combustion of an organic solvent that contains dissolved reagents carrying the desired coating cations. Gaseous fuel CCVD deposition uses a flammable gas as fuel. A non-flammable solution containing dissolved reagents is either aspirated into the flame or mixed with the fuel gas as an aerosol prior to its combustion. Substrates to be coated are held near the flames' ends.IntroductionThin films and coatings can be deposited using a wide variety of techniques including chemical vapor deposition (CVD). CVD is ""a materials synthesis process whereby constituents of the vapor phase react chemically near or on a substrate surface to form a solid product.""lIn conventional CVD processing, gases carrying coating constituents flow into a reaction vessel where deposition occurs onto a heated substrate. The deposition process is often conducted at reduced pressure. Both cold and hot wall reaction chambers are used. Heat can be provided by a resistance furnace, rf induction, or high-intensity radiation lamps. Plasma, microwave, photo, laser, RF, and electron-enhanced CVD processes have been developed. The necessity of using a reaction vessel limits the substrate size and affects coating economics. Although most CVD depositions are performed as batch processes, continuous deposition can be accomplished with the use of appropriate hardware.The chemical vapor deposition of thin, dense oxide films has been accomplished in the open atmosphere with a flame assisted process. The process is called combustion chemical vapor deposition (CCVDSM).2 Two modifications of the CCVD process have been developed. The liquid fuel CCVD process involves the combustion of an organic solvent in which reagents (containing the coating cations) are dissolved. The gaseous fuel CCVD process uses a flammable gas as fuel. In this modification, a non-flammable solution containing dissolved reagents is either aspirated into the flame or mixed with the fuel gas as an aerosol of small droplets prior to its combustion. Substrates to be coated are held near the flames' ends."
Citation

APA: W. B. Carter G. W. Book A. T. Hunt  (1994)  Combustion Chemical Vapor Deposition of Ceramic Coatings

MLA: W. B. Carter G. W. Book A. T. Hunt Combustion Chemical Vapor Deposition of Ceramic Coatings. The Minerals, Metals and Materials Society, 1994.

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