Characterization of Intermediate Sulfur Layer during Acidic Oxidation of Chalcopyrite using Electrochemical Impedance Spectroscopy (EIS) and Atomic Force Microscope Spectroscopic (AFM)

The utilization of Electrochemical Impedance Spectroscopy (EIS) in conjunction with Atomic Force Microscopy (AFM) is a powerful surface characterization technique to study the role of sulfur formation during acidic oxidation of chalcopyrite. It has been established that the chalcopyrite dissolution kinetics is controlled by the formation of passive sulfur layer during leaching. The objective of the study was to characterize the intermediate sulfur layer formation at different oxidation conditions in acidic solution. The chalcopyrite samples were subjected to anodic oxidation and the oxidation process was analyzed using impedance spectroscopy. The sulfur growth on the chalcopyrite surface during oxidation was further analyzed using Atomic Force Microscope for sulfur roughness and grain size, peak height and sulfur growth.