Characterization and Preparation of Anti-Reflection Coatings in the Range of 3-5 µm for Si Optical Window

"Thin film multilayer anti-reflection coatings (Si02/Si/Si02) having thicknesses 286/571/143nm were deposited by RF magnetron sputtering deposition technique on 0.5mm thick Si(100)-substrates. Post-deposition annealing is also carried out in the temperature range 150-650°C for 4hr at the rate of 10°C /min. Si Optical window was designed at 4.21lm wavelengths and correlated with modeling software. The films are transparent in the 3-51lffi band of the electromagnetic spectrum, firmly adhered to the substrate. The prepared multilayer thin films are characterized optically and structurally using a spectrophotometer, an atomic force microscope, x-ray diffraction and a scanning electron microscope. Optical and structural characterizations show that the %transmittance is between 60% and 75%, no appreciable change in crystal structure and roughness of coatings vary between 9 and 25 nm when annealed in the temperature range of 150-650oC. Local elemental characterization on the surface of the thin film was carried out using energy dispersive spectroscopy. The quantitative result of energy dispersive spectroscopy has also shown that the ratio of Si to 0 on the film is 0.67: 1.IntroductionSi02 thin films have unique properties in the interfaces with Si and most studied materials in the field of microelectronics and optical devices [1]. Multilayer thin films are using nowadays in the design and fabrication of the shrinking systems with a variety of fields such as optoelectronic devices. The physical properties and parameters can be controlled at scales of microns down to nanometers by using RF magnetron sputtering system [2].Silicon and Silicon dioxide are used as coating materials [3]. These thin films are laid on top of each other in SiO2/Si/Si02 order by RF magnetron sputtering on top of a substrate as given in Table 1."