An Electrolytic Etch Technique for Aluminum

"AbstractA polishing .technique is described together with two anodic etching methods for aluminum and its alloys. Some of the optical and structural characteristics of the film formed by •these etching methods are discussed and it is shown to what degree these properties of the film are related to the crystallographic orientation of the metallic substrate. Applications to the study of recrystallization and twinning phenomena and to the study of plastic deformation, banding, and texture estimation are discussed. Micrographs are shown .to illustrate the manner in which the technique is particularly well suited to the study of such phenomena.IntroductionThe physical metallurgist is constantly faced with the problem of polishing and etching of metallic sections. Mechanical polishing is tedious, time consuming, and not applicable whenever a surface entirely free from plastic deformation is required. Etchants are generally required to reveal the grain structure in order to determine its size, shape, and regularity, or to bring up constituents. In the case of aluminum, the .most common etchant to reveal grains is a mixture of three acids: HC1, HN03, and HF. This etchant is fairly satisfactory on certain alloys and for certain metallurgical conditions but in general fails to give a good definition of the grain on castings, on highly alloyed products, and whenever the grain is smaller than 100 microns in diameter. Besides size and shape, a grain, or crystal, has an orientation and may be endowed with several types of imperfections."